
| Yamashita Denso Corporation > Mask Alignment Exposure SystemUFM-50110R |
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Mask Alignment Exposure System
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UFM-1010It is a light source to expose an irradiation area of circular 100 mm uniformly, using a mercury xenon lamp 1KW. It fixes the irradiation area and irradiation strength by the lamp capacity and the optical system. The illumination distribution of the irradiation position is within +/-3 % and the parallel degree is within +/-3 degrees. |
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UFM-200It is a light source to expose an irradiation area of 50mm x 50mm uniformly using a 200W mercury xenon lamp. Because there is a source for the upper direction and the lower direction irradiation of the light, it is possible to expose both sides at the same time. The illumination distribution of the irradiation position is within +/-5 % and the parallel degree is within +/-3 degrees. |
| ▲PAGETOP |
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Ultraviolet Power MeterIt is used for the purpose of measuring ultraviolet strength. Sensor: 254nm, 313nm, 365nm, 405nm and 436nm. |
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Wavelength Select Elliptical MirrorYou can select a elliptical mirror by the wavelength area (DUV or UV). Used together with the wavelength select plane mirror and the filter, the irradiation spectrum band is narrowed. (254nm, 313nm, 365nm, 405nm and 436nm) |
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Wavelength Select Plane MirrorYou can select a plane mirror by the wavelength area (DUV or UV). Used together with the wavelength select elliptical mirror and the filter, the irradiation spectrum band is narrowed. |
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Wavelength Select FilterUsed together with the wavelength select elliptical mirror and the plane mirror, the irradiation spectrum band is narrowed. It has especially excellent heat resistance and the wavelength does not shift from heat. |
| For details, please contact us at: HOLOGENIX or YDC |
| ▲PAGETOP |